Aluminum Oxide (AlOx) Tunnel Barrier

Superconducting Materials

The Quantum Tunneling Element — Heart of the Josephson Junction

Non-superconducting amorphous dielectric (~1–3 nm)

Aluminum Oxide (AlOx) Tunnel Barrier

The Quantum Tunneling Element — Heart of the Josephson Junction

Role in quantum circuits

Insulating tunnel barrier in Al/AlOx/Al Josephson junctions — defines qubit nonlinearity

Why it matters

The AlOx tunnel barrier is the most critical element in superconducting qubits. Formed

by controlled thermal oxidation of aluminum, it creates a ~1–2 nm amorphous oxide through which Cooper pairs tunnel, producing the non-linear inductance that makes a qubit distinct from a classical LC oscillator.

Key facts

  • Formed by controlled O₂ exposure of Al surface (thermal oxidation)

  • Thickness (~1–2 nm) sets the critical current Ic of the junction

  • Amorphous structure introduces TLS defects — primary decoherence source

  • Shadow-angle evaporation produces self-aligned Josephson junctions

  • Cleaner barriers can extend (T_1) coherence times